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Preferential oligomerization of isobutene in a mixture of isobutene and 1-butene over sodium-modified 12-tungstosilicic acid supported on silica

机译:异丁烯和1-丁烯混合物中异丁烯在二氧化硅上负载的钠修饰的12-钨硅酸上的优先低聚

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摘要

Modification of 15 wt% H4SiW12O40/SiO2 with Na+ ions was investigated. Na-modified H4SiW12O40/SiO2 showed higher selectivity for isobutene oligomerization in the preferential oligomerization of isobutene in an equimolar mixture of isobutene and 1-butene than the unmodified one and the selectivity increased with an increase in the Na+ ion content. The highest selectivity (~97%) was achieved by using Na3HSiW12O40/SiO2. The activity decreased with an increase in the Na+ ion content. Unmodified H4SiW12O40/SiO2 had two kinds of acid sites with different acid strengths (medium and strong acid sites) on the outermost surface as revealed by temperature-programmed desorption of benzonitrile. However, the strong acid sites were eliminated by modification with alkaline metal cations: for example, Na3HSiW12O40/SiO2 had a negligible amount of strong acid sites. Thus, we concluded that the absence of strong acid sites on the outermost surface is the reason for the high selectivity. Li3HSiW12O40/SiO2 and K3HSiW12O40/SiO2 also exhibited high selectivity for isobutene oligomerization with activities comparable to that of Na3HSiW12O40/SiO2.
机译:研究了Na +离子对15 wt%H4SiW12O40 / SiO2的改性。在异丁烯和1-丁烯的等摩尔混合物中,异丁烯的优先低聚反应中,Na修饰的H4SiW12O40 / SiO2的异丁烯低聚选择性比未修饰的异丁烯低聚的选择性高,且选择性随Na +离子含量的增加而增加。使用Na3HSiW12O40 / SiO2可获得最高的选择性(〜97%)。活性随着Na +离子含量的增加而降低。未改性的H4SiW12O40 / SiO2在最外表面具有两种酸位,具有不同的酸强度(中酸位和强酸位),这是通过程序编程的苄腈脱附揭示的。但是,通过用碱金属阳离子进行修饰可以消除强酸位:例如,Na3HSiW12O40 / SiO2的强酸位可忽略不计。因此,我们得出结论,在最外层表面上不存在强酸位是高选择性的原因。 Li3HSiW12O40 / SiO2和K3HSiW12O40 / SiO2还表现出对异丁烯低聚的高选择性,其活性与Na3HSiW12O40 / SiO2相当。

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